{"title":"RLS-LT控制器的在线优化参数——在混合产品和特征老化过程中的应用","authors":"G. Graton, E. E. Adel, M. Ouladsine, J. Pinaton","doi":"10.1109/ICOSC.2016.7507071","DOIUrl":null,"url":null,"abstract":"This paper presents an iterative approach, which provides optimal solutions of the best achievement performance in the case of closed-loop aged-based processes applied on semiconductor manufacturing industry. The aim is to provide an online parameter estimation of RLS-LT controller in the case of mixed product Run-to-Run (RtR) control. The online estimation is done without any a priori knowledge of process parameters and noise structure. The best achievement performance improvement is illustrated using a simulation problem from literature and the example is applied on the removal rate control in a Chemical Mechanical Polishing (CMP) process.","PeriodicalId":149249,"journal":{"name":"2016 5th International Conference on Systems and Control (ICSC)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Online optimized parameters for RLS-LT controller - application to processes with mixed products and feature aging\",\"authors\":\"G. Graton, E. E. Adel, M. Ouladsine, J. Pinaton\",\"doi\":\"10.1109/ICOSC.2016.7507071\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents an iterative approach, which provides optimal solutions of the best achievement performance in the case of closed-loop aged-based processes applied on semiconductor manufacturing industry. The aim is to provide an online parameter estimation of RLS-LT controller in the case of mixed product Run-to-Run (RtR) control. The online estimation is done without any a priori knowledge of process parameters and noise structure. The best achievement performance improvement is illustrated using a simulation problem from literature and the example is applied on the removal rate control in a Chemical Mechanical Polishing (CMP) process.\",\"PeriodicalId\":149249,\"journal\":{\"name\":\"2016 5th International Conference on Systems and Control (ICSC)\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-05-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 5th International Conference on Systems and Control (ICSC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICOSC.2016.7507071\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 5th International Conference on Systems and Control (ICSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICOSC.2016.7507071","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Online optimized parameters for RLS-LT controller - application to processes with mixed products and feature aging
This paper presents an iterative approach, which provides optimal solutions of the best achievement performance in the case of closed-loop aged-based processes applied on semiconductor manufacturing industry. The aim is to provide an online parameter estimation of RLS-LT controller in the case of mixed product Run-to-Run (RtR) control. The online estimation is done without any a priori knowledge of process parameters and noise structure. The best achievement performance improvement is illustrated using a simulation problem from literature and the example is applied on the removal rate control in a Chemical Mechanical Polishing (CMP) process.
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