铜薄膜结构与光学性能的研究

2018 IEEE 38th International Conference on Electronics and Nanotechnology (ELNANO) Pub Date : 2018-04-01 DOI:10.1109/ELNANO.2018.8477448

B. Babych, O. Borisova, O. Machulianskyi, M. Rodionov, V. Verbitskiy, V. Machulianskyi, Y. Yakymenko

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引用次数: 3

摘要

采用真空磁控辅助溅射(直流)技术，在不同的工艺模式(沉降速度、工作压力、放电功率)下制备铜纳米层。介绍了在石英、玻璃和硅基底上沉积1 ~ 65 nm厚铜纳米膜的微观结构研究结果。在$0.2\ \mu\text{m}$到$1.1\ \mu\text{m}$的波长范围内，研究了铜纳米膜的透射和反射光谱，薄膜的透射和反射光谱与已知块状材料的光谱基本一致。所得结果对于开发具有预设光学特性的纳米结构系统以及设计用于光电子、信息和节能技术的功能器件具有重要的实际意义。

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Investigation of the Structure and Optical Properties of Thin Copper Films

Copper nanolayers were formed using the vacuum magnetron-assisted sputtering (direct current) in various technological modes (sedimentation speed, working pressure, discharge power). Results of microstructural study of the 1 nm to 65 nm thick copper nanofilms deposited on quartz, glass and silicon substrates are presented. Spectra of transmission and reflection coefficients of the copper nanofilms were studied in the wavelength range from $0.2\ \mu\text{m}$ to $1.1\ \mu\text{m}$, The transmission and reflection spectra of films correspond well to the known spectra of bulk materials. The obtained results are of practical importance for development of nanostructural systems with the preset optical properties and for design of functional devices to be used in optoelectronics, information and energy-saving technologies.

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来源期刊

2018 IEEE 38th International Conference on Electronics and Nanotechnology (ELNANO)

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