用于抗反射的周期性亚波长表面浮雕结构

2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) Pub Date : 2012-08-01 DOI:10.1109/3M-NANO.2012.6472953

X. Gu, W. Liu, W. Zhang, F. Zhang, L. Yuan, Y. Y. Wang, C. Peng

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引用次数: 1

摘要

在硅衬底上模拟了三种不同高度(300、500和700 nm)的周期性亚波长纳米锥的抗反射性能。在纳米锥的顶部，我们添加了一层厚度分别为10 nm、20 nm和30 nm的Ni和SiO2。采用严格耦合波分析(RCWA)方法研究了带或不带纳米掩膜的纳米结构的反射特性。

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Periodic sub-wavelength surface-relief structures for antireflection

Periodic sub-wavelength nanocones were simulated for antireflection with three different heights: 300, 500 and 700 nm on Si substrate. On the top of nanocones, we add a layer of Ni and SiO2 with the thicknesses of 10 nm, 20 nm and 30 nm. The reflective characteristics of nanostructures with or without nanomasks were studied by rigorous coupled-wave analysis (RCWA).

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2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

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