硅纳米线中的压阻效应-基于第一性原理计算的综合分析

K. Nakamura, D. Dao, B. T. Tung, T. Toriyama, S. Sugiyama
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引用次数: 8

摘要

采用第一性原理计算方法,模拟了带有氢端接的单晶硅纳米线的电子态和压阻效应对机械应变的响应。基于我们最初对少量载流子占用的想法,我们根据一维第一性原理能带图得出的载流子密度及其相应的有效质量,计算了沿导线轴的载流子电导率。在端氢SiNW模型中,纵向的单轴拉伸应力导致最高价带(VB)子带能带能急剧下降,导致空穴重新分布到其他具有巨大空穴有效质量的VB子带。随着有效质量的增加,孔占比的突然变化将导致孔电导率的急剧下降。我们已经获得了p掺杂SiNW模型的巨大纵向压阻系数,并且由于其巨大的压阻性,预计无悬空键的p掺杂SiNW将成为NEMS压阻器最合适的候选者之一。相反,掺p的SiNW的空穴导电性仅取决于最高VB子带的空穴迁移率。因此,无悬垂键的p型SiNW的纵向和横向压阻系数都很小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Piezoresistive effect in silicon nanowires — A comprehensive analysis based on first-principles calculations
We have simulated the electronic states and the piezoresistive effect response to mechanical strain in single-crystal silicon nanowires (SiNWs) with hydrogen termination by using first-principles calculations of model structures with various wire orientations. Based on our original idea for a small amount of carrier occupation, the carrier conductivity along the wire axis has been calculated in terms of band carrier densities and their corresponding effective masses derived from the one-dimensional first-principles band diagram. In the hydrogen-terminated <001> SiNW model, the uniaxial tensile stress to the longitudinal direction causes a sharp drop in the band energy of the highest valence-band (VB) subband, leading to the redistribution of holes to other VB subbands with a huge hole effective mass. The sudden change in the hole occupation with the increase in effective mass will bring a drastic decrease in the hole conductivity. We have obtained a giant longitudinal piezoresistance coefficient for the p-doped <001> SiNW model, and it is expected that p-doped <001> SiNW without dangling bonds will be one of the most suitable candidates for NEMS piezoresistors due to its giant piezoresistivity. On the contrary, the hole conductivity for the p-doped <111> SiNW depends only on the hole mobility of the highest VB subband. As a result, the longitudinal and transverse piezoresistance coefficients for p-type <111> SiNW without dangling bonds are very small.
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