相变光学记录中Ge/sub 2/Sb/sub 2.3/Te/sub 5/薄膜沉积态、熔融淬火态和激发态非晶态的结晶行为

P. Khulbe, E. Wright, T. Hurst, M. Mansuripur
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引用次数: 2

摘要

在相变(PC)光学数据存储中,利用聚焦的高功率激光脉冲将信息记录为亚微米大小的非晶标记(位)在移动的多晶硫系薄膜上。它将薄膜的局部温度提高到其熔化温度(T/sub M/)以上,随后的快速冷却会留下无定形的痕迹。这些非晶标记可以被擦除(即,再结晶),通过局部退火它们高于存储材料的玻璃化转变温度,在相同的聚焦激光束下,在中等功率水平。本文将讨论用于数据存储的Ge/sub 2/Sb/sub 2.3/Te/sub 5/ (GST)薄膜的结晶行为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Crystallization behavior of as-deposited, melt-quenched, and primed amorphous states of Ge/sub 2/Sb/sub 2.3/Te/sub 5/ films in phase change optical recording
In phase change (PC) optical data storage, information is recorded as sub-micron sized amorphous marks (bits) on a moving polycrystalline chalcogenide film using a focused high power laser pulse. It raises the local temperature of the film above its melting temperature (T/sub M/) and the subsequent rapid cooling leaves an amorphous mark. These amorphous marks can be erased (i.e., re-crystallized) by locally annealing them above the glass transition temperature of the storage material under the same focused laser beam at a moderate power level. Here, we will discuss the crystallization behavior of the as-deposited, melt-quenched and primed Ge/sub 2/Sb/sub 2.3/Te/sub 5/ (GST) film used in data storage.
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