光子器件应变硅肋结构中的晶格变形

D. Marini, G. B. Montanari, F. Mancarella, M. Ferri, R. Balboni, G. Bolognini
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引用次数: 4

摘要

本文报道了由化学计量氮化硅(Si3N4)层沉积引起的硅肋结构晶格变形的理论和实验研究。在绝缘体上硅(SOI)平台上模拟了硅肋中的应力和应变分布,并估计了结构的光学性质;此外,利用会聚束电子衍射(CBED)技术对氮硅界面附近的微加工肋状结构进行了局部精确的应变测量。实验结果,以及与模拟的比较,指出了显著的诱导应力值允许实现电光器件,如调制器和开关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Lattice deformations in strained-silicon rib structures for photonic devices
This work reports a theoretical and experimental study on lattice deformation in silicon-rib structure induced by deposition of a stoichiometric silicon-nitride (Si3N4) layer. Simulations of stress and strain distributions in silicon rib were performed along with estimation of optical properties for structures on a silicon-on-insulator (SOI) platform; moreover, locally-accurate strain measurements were performed on the microfabricated rib structures in proximity of the nitride-to-silicon interface employing the Convergent Beam Electron Diffraction (CBED) technique. Experimental results, as well as comparison with simulations, pointed out significant induced stress values permitting to achieve electro-optical devices such as modulators and switches.
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