硅基系统中的量子信息处理

Tsung-Yeh Yang, A. Andreev, Y. Yamaoka, T. Ferrus, S. Oda, T. Kodera, D. Williams
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引用次数: 3

摘要

首次在4.2 K的硅基电荷量子比特(qubit)器件中观察到长达数十微秒的长相干时间(T2)。本文展示的相干时间比报道的半导体电荷量子比特系统长两个数量级,工作温度比报道的半导体电荷量子比特系统高两个数量级(见表1)。与其他方法相比,在这项工作中,量子比特是通过沟槽隔离而不是表面门定义形成的。量子比特是通过当前的工业半导体制造技术在掺磷的绝缘体上硅(SOI)晶圆上制造的。我们已经证明了通过使用单电子晶体管(SET)作为静电计来准确读出量子位的电子状态。利用电荷检测技术首次观察到两组电容耦合电荷运动之间的相互作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantum information processing in a silicon-based system
For the first time, long coherence times (T2) up to tens of microseconds were observed in a silicon-based charge quantum bit (qubit) device at 4.2 K. The coherence times demonstrated in this paper are two orders of magnitude longer, and the operating temperature is two orders of magnitude higher than the reported semiconductor charge qubit systems (see Table 1). In contrast to other approaches, in this work the qubits are formed by trench isolation instead of surface gate-defined. The qubits were fabricated on P-doped silicon-on-insulator (SOI) wafers through current industrial semiconductor manufacturing technology. We have demonstrated the accurate readout of the qubits' electronic states by using a single electron transistor (SET) as an electrometer. The first observation of the interaction between two sets of capacitively coupled charge movements was achieved by using our charge detection technique.
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