Superpolishing Sapphire

O. Weis, B. Hader
{"title":"Superpolishing Sapphire","authors":"O. Weis, B. Hader","doi":"10.1364/oft.1990.jtua4","DOIUrl":null,"url":null,"abstract":"We discuss superpolishing of a-cut sapphire which leads to a residual roughness less then 0.05 nm rms. There remains no damage layer. Polishing time is typically 15 to 30 minutes. The flatness is determined mainly by prepolishing. Curved surfaces can also be polished by this method. The lowest roughness is achieved, if removal rates are low, i.e. about 10 nm/min which corresponds to about half an atomic layer per second.","PeriodicalId":354934,"journal":{"name":"Optical Fabrication and Testing","volume":"124 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Superpolishing Sapphire\",\"authors\":\"O. Weis, B. Hader\",\"doi\":\"10.1364/oft.1990.jtua4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We discuss superpolishing of a-cut sapphire which leads to a residual roughness less then 0.05 nm rms. There remains no damage layer. Polishing time is typically 15 to 30 minutes. The flatness is determined mainly by prepolishing. Curved surfaces can also be polished by this method. The lowest roughness is achieved, if removal rates are low, i.e. about 10 nm/min which corresponds to about half an atomic layer per second.\",\"PeriodicalId\":354934,\"journal\":{\"name\":\"Optical Fabrication and Testing\",\"volume\":\"124 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Fabrication and Testing\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/oft.1990.jtua4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Fabrication and Testing","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/oft.1990.jtua4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

我们讨论了a型切割蓝宝石的超抛光导致残余粗糙度小于0.05 nm rms。没有伤害层。抛光时间通常为15至30分钟。平面度主要由预抛光决定。曲面也可以用这种方法抛光。如果去除速率低,即约10 nm/min,即每秒约半原子层,则达到最低的粗糙度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Superpolishing Sapphire
We discuss superpolishing of a-cut sapphire which leads to a residual roughness less then 0.05 nm rms. There remains no damage layer. Polishing time is typically 15 to 30 minutes. The flatness is determined mainly by prepolishing. Curved surfaces can also be polished by this method. The lowest roughness is achieved, if removal rates are low, i.e. about 10 nm/min which corresponds to about half an atomic layer per second.
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