全息聚合物分散液晶存储器对γ射线辐照的抗性评价

2017 22nd Microoptics Conference (MOC) Pub Date : 2017-11-01 DOI:10.23919/MOC.2017.8244556

A. Ogiwara, Minoru Watanabe, Yoshizumi Ito

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引用次数: 1

摘要

针对光学可重构门阵列对高可靠性要求的应用，研究了全息聚合物分散液晶(HPDLC)存储器的抗辐射特性。利用钴60 γ辐射源研究了光栅的光学特性和内部光栅结构，并对其在100mrad总电离剂量下的抗辐照性能进行了测试。

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Resistance evaluation of holographic polymer-dispersed liquid crystal memory for gamma-ray irradiation

The radiation-hardened characteristics of holographic polymer-dispersed liquid crystal (HPDLC) memory are investigated for the applications requiring high reliability using an optically reconfigurable gate array. The optical properties and internal grating structures are investigated by using a cobalt 60 gamma radiation source to examine the resistance of 100 Mrad total-ionizing-dose.

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2017 22nd Microoptics Conference (MOC)

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