考虑工艺变化影响的纳米电子电路时延优化策略

J. Tisza, M. Chauca
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引用次数: 0

摘要

在这项工作中,提出并评估了两种策略来实现纳米电子数字电路中延迟变化的优化,考虑到制造过程的变化。通过在8个ISCAS电路中的应用,对这两种策略进行了评估。结果显示了由于应用这两种策略,每个电路上延迟时间和功耗差异的百分比变化的比较。在本文中,所有测试电路的结果都以完整的形式呈现。其中一种策略称为一个跟踪,另一种称为跟踪。第一种方法使用拉格朗日方法和Karush Kuhn Tucker定理,第二种方法是逐步调整大小,在限制允许的情况下,以恒定值的离散步骤增加临界门的宽度。在程序的应用过程中,电路的总状态在每个步骤中被评估。在这两种策略中,都对延迟时间的方差进行了优化,限制了所使用的面积,并计算了所消耗的功率。结果以表格和图形形式呈现。最后,给出了研究的结论和观察结果。代码是在c++中实现的,它使用65nm技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Strategies for Optimization of Time Delay in Nanoelectronics Circuits with Process Variations Effects
In this work it is presented and evaluated two strategies to achieve the optimization of the variance of delay in nanoelectronic digital circuits, taking into account the variations due to the manufacturing process. The evaluations of both strategies are developed through applications in 8 ISCAS circuits. The results show comparisons in percentage changes in the variances of delay time and power consumption on each circuit because of applying these two strategies. In this article, the results are presented in full form for all tested circuits. One of the strategies is called ONE TRACK and the other TRACKING. The first uses the LaGrange method with Karush Kuhn Tucker's theorem and the second develops a progressive resizing, increasing the width of the critical gates in discrete steps of constant value as far as restrictions allow. During the application of the procedure, the total state of the circuit is evaluated in each step. In both strategies, the variance of the delay time is optimized with restriction of the area used and the power consumed is calculated. The results are presented in tabular and graphical form. Finally, conclusions and observations from the study are issued. The codes are implemented in C++ and it is used a 65 nm technology.
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