{"title":"紧凑层次化流形微通道散热阵列流动沸腾的实验研究","authors":"Kevin P. Drummond, J. Weibel, S. Garimella","doi":"10.1109/SEMI-THERM.2017.7896921","DOIUrl":null,"url":null,"abstract":"This work focuses on the fabrication and experimental characterization of a two-phase hierarchical manifold microchannel heat sink array for intrachip high-heat-flux dissipation. A test device with a 5 mm × 5 mm heated area and 9 × 9 array of heat sinks, each with 18 parallel channels (19 µm × 155 µm), is fabricated in silicon. A multi-layer hierarchical manifold fabricated in silicon is bonded to the heat sink array. Flow boiling experiments are conducted using HFE-7100 as the working fluid at mass fluxes of 200 kg/m<sup>2</sup>s and 300 kg/m<sup>2</sup>s. The test device is able to dissipate heat fluxes up to 445 W/cm<sup>2</sup> at a chip temperature of less than 40 °C above the fluid and at a pressure drop less than 80 kPa. A maximum heat transfer coefficient of 31,900 W/m<sup>2</sup>K occurred at a mass flux of 300 kg/m<sup>2</sup>s and a heat flux of 301 W/cm<sup>2</sup>. The effects of heat flux on chip temperature, heat transfer coefficient, and pressure drop are investigated.","PeriodicalId":442782,"journal":{"name":"2017 33rd Thermal Measurement, Modeling & Management Symposium (SEMI-THERM)","volume":"115 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Experimental study of flow boiling in a compact hierarchical manifold microchannel heat sink array\",\"authors\":\"Kevin P. Drummond, J. Weibel, S. Garimella\",\"doi\":\"10.1109/SEMI-THERM.2017.7896921\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work focuses on the fabrication and experimental characterization of a two-phase hierarchical manifold microchannel heat sink array for intrachip high-heat-flux dissipation. A test device with a 5 mm × 5 mm heated area and 9 × 9 array of heat sinks, each with 18 parallel channels (19 µm × 155 µm), is fabricated in silicon. A multi-layer hierarchical manifold fabricated in silicon is bonded to the heat sink array. Flow boiling experiments are conducted using HFE-7100 as the working fluid at mass fluxes of 200 kg/m<sup>2</sup>s and 300 kg/m<sup>2</sup>s. The test device is able to dissipate heat fluxes up to 445 W/cm<sup>2</sup> at a chip temperature of less than 40 °C above the fluid and at a pressure drop less than 80 kPa. A maximum heat transfer coefficient of 31,900 W/m<sup>2</sup>K occurred at a mass flux of 300 kg/m<sup>2</sup>s and a heat flux of 301 W/cm<sup>2</sup>. The effects of heat flux on chip temperature, heat transfer coefficient, and pressure drop are investigated.\",\"PeriodicalId\":442782,\"journal\":{\"name\":\"2017 33rd Thermal Measurement, Modeling & Management Symposium (SEMI-THERM)\",\"volume\":\"115 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 33rd Thermal Measurement, Modeling & Management Symposium (SEMI-THERM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SEMI-THERM.2017.7896921\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 33rd Thermal Measurement, Modeling & Management Symposium (SEMI-THERM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SEMI-THERM.2017.7896921","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Experimental study of flow boiling in a compact hierarchical manifold microchannel heat sink array
This work focuses on the fabrication and experimental characterization of a two-phase hierarchical manifold microchannel heat sink array for intrachip high-heat-flux dissipation. A test device with a 5 mm × 5 mm heated area and 9 × 9 array of heat sinks, each with 18 parallel channels (19 µm × 155 µm), is fabricated in silicon. A multi-layer hierarchical manifold fabricated in silicon is bonded to the heat sink array. Flow boiling experiments are conducted using HFE-7100 as the working fluid at mass fluxes of 200 kg/m2s and 300 kg/m2s. The test device is able to dissipate heat fluxes up to 445 W/cm2 at a chip temperature of less than 40 °C above the fluid and at a pressure drop less than 80 kPa. A maximum heat transfer coefficient of 31,900 W/m2K occurred at a mass flux of 300 kg/m2s and a heat flux of 301 W/cm2. The effects of heat flux on chip temperature, heat transfer coefficient, and pressure drop are investigated.