{"title":"测量二维光子晶体位错的统计方法","authors":"Radu Malureanu, Lars Hagedorn Frandsen","doi":"10.1109/ICONN.2008.4639281","DOIUrl":null,"url":null,"abstract":"In this paper, a comparison between the placement accuracy of lattice atoms in photonic crystal structures fabricated with different lithographic techniques is made. Using atomic force microscopy measurements and self-developed algorithms for calculating the holes position within less than 0.01 nm error, we establish the statistical disorder within such devices.","PeriodicalId":192889,"journal":{"name":"2008 International Conference on Nanoscience and Nanotechnology","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"A statistical approach for measuring dislocations in 2D photonic crystals\",\"authors\":\"Radu Malureanu, Lars Hagedorn Frandsen\",\"doi\":\"10.1109/ICONN.2008.4639281\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, a comparison between the placement accuracy of lattice atoms in photonic crystal structures fabricated with different lithographic techniques is made. Using atomic force microscopy measurements and self-developed algorithms for calculating the holes position within less than 0.01 nm error, we establish the statistical disorder within such devices.\",\"PeriodicalId\":192889,\"journal\":{\"name\":\"2008 International Conference on Nanoscience and Nanotechnology\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-10-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 International Conference on Nanoscience and Nanotechnology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICONN.2008.4639281\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 International Conference on Nanoscience and Nanotechnology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICONN.2008.4639281","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A statistical approach for measuring dislocations in 2D photonic crystals
In this paper, a comparison between the placement accuracy of lattice atoms in photonic crystal structures fabricated with different lithographic techniques is made. Using atomic force microscopy measurements and self-developed algorithms for calculating the holes position within less than 0.01 nm error, we establish the statistical disorder within such devices.
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