紫外发光led的实现

T. Morishita
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引用次数: 0

摘要

随着新型冠状病毒大流行在全球范围内的持续传播,深紫外线灭活病毒的有效性备受关注。汞灯被广泛用作深紫外光源;然而,近年来,深紫外led因其具有环境负荷低、启动时间短等优点而备受关注。病毒的灭活和杀菌是通过其DNA吸收深紫外光来实现的,深紫外光破坏了DNA的双螺旋结构,从而失去了扩增功能。因此,如图1所示,深紫外光的杀菌效率在265 nm左右的波长区域最高,在该波长区域DNA的深紫外光吸收率最高(1)。传统的深紫外led是在蓝宝石衬底和SiC衬底上制造的(2 - 4);然而,当使用这种衬底时,半导体材料的晶格常数和热膨胀系数的差异很大。因此,会出现密度在108cm -2以上的线缺陷,从而导致发光效率低下。因此,为了降低线缺陷密度,外延横向过度生长(ELO)等方法已被创新。内部量子效率与线缺陷密度之间的关系也被研究,有报道称线缺陷作为非发射复合中心,因此降低线缺陷密度非常重要5,6)。为了解决这些问题,使用氮化铝(AlN)作为衬底是非常有效的,因为它的物理常数(即晶格常数和热膨胀系数)与半导体材料相似。至于在AlN衬底上制造的led,线缺陷密度可以抑制到105 cm-2或更低。更重要的是,利用晶格常数的微小差异,可以制造出在265 nm波段具有高输出的LED,在该波段杀菌效率最高。利用这些技术,我们于2017年商业化推出了“灭菌LED”。此外,我们开发了一种使用265nm LED的“水杀菌模块”,该模块在2L/min的流速下对大肠杆菌(E.)具有99.9%或更高的杀菌性能。2018年5月,我们将基于该LED的水杀菌模块商业化。此外,在新型冠状病毒大流行的背景下,人们对深紫外led的兴趣日益浓厚,我们正在加倍努力,进一步提高led的效率。LED效率表示为载流子注入效率、内部量子效率和光提取效率的乘积。鉴于此,我们通过改进薄膜结构提高了载流子注入效率,并通过改进AlN衬底的制造技术,将AlN衬底的吸收系数降低到15-30 cm-1,从而提高了光提取效率。目前,我们已经开始供应一系列led(驱动电流为500毫安,波长为265纳米,输出功率为60和70兆瓦)以及大功率(相同波长的80兆瓦或更多)led作为工程样品(图2)7)。doi: 10.2150 / jstl.IEIJ20A000008
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Realization of UV-emitting LEDs
As the novel-coronavirus pandemic continues to spread globally, the effectiveness of deep-ultraviolet rays in regard to inactivating the virus is drawing attention. Mercury lamps are widely used as a deepultraviolet light source; however, in recent years, deep-ultraviolet LEDs, which have the advantages of low environmental load and short start-up time, have been attracting attention. The virus is inactivated and sterilization is achieved by its DNA absorbing the deepultraviolet light, which destroys the double-helix structure of the DNA, which thereby loses its amplification function. Accordingly, as shown in Figure 1, the sterilization efficiency of deep-ultraviolet light is the highest in the wavelength region around 265 nm, at which deepultraviolet absorption rate of the DNA is high1). Conventional deep-UV LEDs are manufactured on sapphire substrates and SiC substrates2–4); however, when such substrates are used, the difference in lattice constants and the difference in coefficients of thermal expansion of the semiconductor materials are large. As a result, line defects with density of 108 cm-2 or more occur, and the resulting low luminous efficiency is a problem. Therefore, to reduce that line-defect density, methods such as epitaxial lateral overgrowth (ELO) have been innovated. The correlation between internal quantum efficiency and line-defect density has also been investigated, and it has been reported that a line defect acts as a non-emissive recombination center, so it is very important to reduce line-defect density5, 6). To address these issues, it is very effective to use aluminum nitride (AlN) as the substrate because its physical constants (namely, lattice constant and coefficient of thermal expansion) are similar to those of the semiconductor material. As for LEDs manufactured on an AlN substrate, line-defect density can be suppressed to 105 cm-2 or less. What’s more, taking advantage of the small difference in lattice constants makes it possible to create an LED with high output in the 265-nm wavelength band, in which sterilization efficiency is highest. Utilizing these technologies, we launched a “sterilization LED” commercially in 2017. Moreover, we have developed a “water-sterilization module” using a 265nm LED, and this module demonstrated sterilization performance for Escherichia (E.) coli at flow velocity of 2L/min of 99.9% or more. We commercialized a watersterilization module based on this LED in May 2018. In addition, with the growing interest in deepultraviolet LEDs against the backdrop of the novelcoronavirus pandemic, we are doubling our efforts to further improve the efficiency of LEDs. LED efficiency is expressed as the product of carrier-injection efficiency, internal quantum efficiency, and light-extraction efficiency. Given that fact, we improved (i) carrier-injection efficiency by improving the thin-film structure and (ii) light-extraction efficiency by reducing the absorption coefficient of the AlN substrate to 15–30 cm-1 thanks to enhanced technology for fabricating the AlN substrate. Currently, we have begun supplying a series of LEDs (with outputs of 60 and 70 mW at drive current of 500 mA and wavelength of 265 nm) as well as highpower (80 mW or more at the same wavelength) LEDs as engineering samples (Figure 2)7). doi: 10.2150/jstl.IEIJ20A000008
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