双量子阱伪晶高电子迁移率晶体管结构中的非单调电子迁移率

S. R. Panda, Sudhakar Das, A. Sahu, A. K. Panda, T. Sahu
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引用次数: 0

摘要

在具有双量子阱结构的伪晶GaAs/InxGa1-x As高电子迁移率晶体管中,获得了电子的非单调迁移率$\mu$。由于子带波函数的位移,在子带态共振处出现${\mu}$的下降,这影响了受界面粗糙度散射限制的子带迁移率。随着井宽不对称性的增加,$\mu$的下降幅度也会增大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nonmonotonous Electron Mobility in Double Quantum Well Pseudomorphic High Electron Mobility Transistor Structure
Non-monotonic mobility $\mu$ of electrons is obtained in a pseudomorphic GaAs/InxGa1-x As high electron mobility transistor having a double quantum well structure with asymmetric doping concentrations in the outer barriers. A dip in ${\mu}$ occurs at the resonance of subband states because of the shift of the subband wave functions, which affects the subband mobilities limited by interface roughness scattering. The dip in $\mu$ amplifies with increase in the asymmetry of the width of wells.
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