用各向异性湿法蚀刻制备低损耗硅矩形波导以降低粗糙度

2015 IEEE 12th International Conference on Group IV Photonics (GFP) Pub Date : 2015-08-01 DOI:10.1109/GROUP4.2015.7305962

H. Arimoto, M. Husain, A. Prasmusinto, K. Debnath, A. Al-Attili, R. Petra, H. Chong, G. Reed, S. Saito

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引用次数: 3

摘要

提出了一种低损耗单侧平壁Si/SiO2波导的简单制备方法。采用各向异性湿法刻蚀法制备了Si(110)平面方向波导，其传输损耗最低为1.4 dB/cm。

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Low-loss silicon rectangular waveguides fabricated by anisotoropic wet etching for roughness reduction

Simple fabrication of low-loss Si/SiO2 waveguides with a flat side wall is proposed. Waveguides oriented to the <;11-2> direction on the Si (110) plane are fabricated by anisotropic wet etching and the lowest propagation loss is 1.4 dB/cm.

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2015 IEEE 12th International Conference on Group IV Photonics (GFP)

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