用相移掩模模拟三维负光刻胶图像

{"title":"用相移掩模模拟三维负光刻胶图像","authors":"T. Ishizuka","doi":"10.1016/B978-0-444-88864-8.50156-4","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":106586,"journal":{"name":"Computer Aided Innovation of New Materials","volume":"113 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"SIMULATION OF THREE-DIMENSIONAL NEGATIVE PHOTORESIST IMAGES USING PHASE-SHIFTING MASK\",\"authors\":\"T. Ishizuka\",\"doi\":\"10.1016/B978-0-444-88864-8.50156-4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":106586,\"journal\":{\"name\":\"Computer Aided Innovation of New Materials\",\"volume\":\"113 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Computer Aided Innovation of New Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1016/B978-0-444-88864-8.50156-4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Computer Aided Innovation of New Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1016/B978-0-444-88864-8.50156-4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}