在弯曲基底上沉积要求苛刻的光学涂层

M. Vergöhl, C. Britze, S. Bruns, A. Pflug, V. Kirschner
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引用次数: 0

摘要

本文讨论了在曲面基底(即透镜)上沉积高精度光学涂层。带通滤光片的凸面透镜与一个恒定的中心波长的表面产生。该涂层还具有从360到1100nnm的宽阻挡范围。使用了次旋转和均匀性掩模的组合。掩模的形状是用粒子单元蒙特卡罗方法设计的。将现有的模型框架扩展到计算移动3D基板上的沉积轮廓。在磁控管系统的性能方面也观察到一些令人惊讶的影响。在全三维等离子体模拟中,理论与实验有很好的一致性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Deposition of demanding optical coatings on curved substrates
The paper addresses the deposition of high precision optical coatings on curved substrates, i.e. lenses. A band pass filter on the convex side of a lens with a constant central wavelength across the surface was produced. The coating also has a broad blocking range from 360 to 1100nnm. A combination of a sub-rotation and uniformity masks was used. The shape of the masks was designed with the particle-in cell Monte Carlo method described in. The existing model framework was expanded to compute deposition profiles on moving 3D substrates. Some surprising effects regarding the behavior the magnetron system were also observed. An excellent agreement of theory with experiment could be reached when full 3D plasma simulation is applied.
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