利用三层壳模型确定钛硅碳氮涂层内禀应力

A. Chakraborty, F. Thompson, J. Ash, P. Ahrenkiel, F. Kustas, Robert B. Anderson
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引用次数: 0

摘要

在280℃左右的温度下,用反应磁控溅射技术在301不锈钢的水平和垂直安装条上沉积了具有钛附着层的碳氮化钛硅(TiSiCN)薄膜。观察到垂直和水平样品之间的中间偏转和曲率半径存在相当大的差异。在TEM上进行的横截面表征显示柱状生长和均匀的微观结构。建立了基于Mesh-Tie约束的三层夹层结构的有限元模型,以估计衬底位置和取向对三层夹层结构内部应力水平的影响。用多层薄膜的解析表达式验证了在不考虑内禀应力的情况下的计算模型。在Abaqus中改变初始应力状态参数,直到通过为此专门构建的光学装置获得的物理测量获得曲率值的一致性。S11/S22主应力的差异提供了固有应力估计。然后将计算得到的内禀应力值应用于固定约束条件下的有限元试验模型,计算确定单个样品的应力减小量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Use of a Trilayer Shell Model to Determine Intrinsic Stress Within Titanium-Silicon Carbonitride Coating
Thin films of titanium-silicon carbonitride (TiSiCN) with titanium adhesion layers were deposited at approximately 280°C on horizontally and vertically-mounted strips of 301-stainless steel by reactive magnetron sputtering. Considerable differences in the mid-deflections and radii of curvature between the vertical and horizontal samples were observed. Cross-sectional characterizations done on a TEM revealed a columnar growth and uniform microstructure. A finite-element model of the tri-layer sandwich structure using Mesh-Tie constraints was developed to estimate the intrinsic stress levels in the overcoat as probable functions of substrate location and orientation. The computational model in the absence of intrinsic stress was validated by analytical expressions for multilayer films. The initial stress state parameter was varied in Abaqus until consistency in curvature-values was achieved with the physical measurement obtained from an optical setup specially-constructed for this purpose. The difference in the S11/S22 principal stresses provided the intrinsic stress estimate. The calculated values of intrinsic stress were then applied to an FEA test model with fixed constraints to computationally determine the stress reduction for individual samples.
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