偏斜分布图控制极限的参数自举计算方法

V. Lukin, V. Yaschenko
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引用次数: 0

摘要

本文提出了一种评价非对称分布过程测量图控制极限的参数自举方法。该方法修改了作者基于伪随机数生成(见[1])的控制限评估方法,在评估分布参数的步骤中使用子组内变异(池方差)的无偏估计量,从而降低了过程监测阶段(阶段II)的误报警概率。子组内变异的平均统计量的使用增加了控制限的鲁棒性(到存在)例外变化),允许将建议的方法应用于回顾性分析(阶段I)。该方法不需要对数据进行非线性转换,这可能会使分析结果的技术解释和应用复杂化。所提出的参数自举法可用于在过程测量按照任何(单参数或双参数)理论规律分布时,为任何统计量构造控制图。具有这种分布的质量变量可以在许多行业中找到:电信、电子、机械工程等。在第二阶段,根据i型和II型错误率(使用蒙特卡罗模拟,根据对数正态和威布尔定律分布的过程测量),比较了所提出方法的平均值和标准差图表与替代方法的相同图表1的性能。所提方法的平均图和标准差的第一类错误率比备选方法的平均图和标准差的第一类错误率更接近所需值。所提出方法的这些图表的ii型错误率使它们能够非常快速地检测过程位置和方差的大变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A parametric bootstrap method of computation of control limits of charts for skewed distributions
This article is proposing a new parametric bootstrap method of evaluation of control limits of charts for asymmetrically distributed process measurements. The proposed method modifies the authors' approach to evaluation of control limits based on pseudorandom numbers generation (presented in [1]) by using the unbiased estimator of within-subgroup variation (pooled variance) at the step of evaluation of the distribution parameters hence decreasing the probability of false alarm in a process monitoring phase (Phase II). The use of an average statistic of within-subgroup variation increases the robustness of control limits (to the presence of exceptional variation) that allows applying the proposed method in a retrospective analysis (Phase I). The method does not require nonlinear transformations of data, which may complicate the technical interpretation and application of the results of analysis. The proposed parametric bootstrap method may be used to construct a control chart for any statistic when process measurements are distributed in accordance with any (one- or two-parameter) theoretical law. Quality variables with such distributions are found in many industries: telecommunications, electronics, mechanical engineering, etc. A comparison between the performance of charts for averages and standard deviations of the proposed method and the same charts of alternative methods1 in Phase II is made in terms of type-I and type-II error rates (using Monte Carlo simulations for process measurements distributed in accordance with the lognormal and the Weibull laws). The type-I error rates of charts for averages and standard deviations of the proposed method are closer to the required value than the type-I error rates of charts for averages and standard deviations of the alternative methods. The type-II error rates of these charts of the proposed method enable them to detect large shifts in the process location and variance very quickly.
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