{"title":"光学投影机的照明要求:以及如何考虑这些要求","authors":"D. Goodman","doi":"10.1364/sxray.1991.fb1","DOIUrl":null,"url":null,"abstract":"Illumination systems are often given too little thought, since the main lens in a projector is usually much more difficult, and because many of the effects of non-optimimum illumination are too small to be noticed in many applications. For modern chip lithography, however, nothing can be assumed negligible.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Illumination Requirements for Optical Projectors: and how to think about them\",\"authors\":\"D. Goodman\",\"doi\":\"10.1364/sxray.1991.fb1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Illumination systems are often given too little thought, since the main lens in a projector is usually much more difficult, and because many of the effects of non-optimimum illumination are too small to be noticed in many applications. For modern chip lithography, however, nothing can be assumed negligible.\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"18 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1991.fb1\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1991.fb1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Illumination Requirements for Optical Projectors: and how to think about them
Illumination systems are often given too little thought, since the main lens in a projector is usually much more difficult, and because many of the effects of non-optimimum illumination are too small to be noticed in many applications. For modern chip lithography, however, nothing can be assumed negligible.
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