{"title":"InAs-GaSb红外光电探测器表面钝化优化","authors":"E. Meyer, K. Banerjee, Siddhartha Ghosh","doi":"10.5210/JUR.V2I1.7465","DOIUrl":null,"url":null,"abstract":"A type II indium arsenide / gallium antimonide (InAs-GaSb) strained layer superlattice (SLS) semiconductor is optimal for detecting long wavelength infrared (LWIR) signals for infrared imaging applications. However, as with all crystal structures dangling bonds at the surface of the semiconductor must be pacified with a passivant to maintain the integrity of the semiconductor. We report the most effective passivation layer for this III-V semiconductor by examining both the material and device characteristics of the devices pacified by silicon dioxide (SiO 2 ), silicon nitride (Si x N y ), and zinc sulfide (ZnS). Our final reporting shows ZnS with a pre-passivation of ammonium sulfide ((NH 4 ) 2 S) as being the most effective passivant.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimization of Surface Passivation for InAs-GaSb Infrared Photodetector\",\"authors\":\"E. Meyer, K. Banerjee, Siddhartha Ghosh\",\"doi\":\"10.5210/JUR.V2I1.7465\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A type II indium arsenide / gallium antimonide (InAs-GaSb) strained layer superlattice (SLS) semiconductor is optimal for detecting long wavelength infrared (LWIR) signals for infrared imaging applications. However, as with all crystal structures dangling bonds at the surface of the semiconductor must be pacified with a passivant to maintain the integrity of the semiconductor. We report the most effective passivation layer for this III-V semiconductor by examining both the material and device characteristics of the devices pacified by silicon dioxide (SiO 2 ), silicon nitride (Si x N y ), and zinc sulfide (ZnS). Our final reporting shows ZnS with a pre-passivation of ammonium sulfide ((NH 4 ) 2 S) as being the most effective passivant.\",\"PeriodicalId\":426348,\"journal\":{\"name\":\"The Journal of Undergraduate Research at the University of Illinois at Chicago\",\"volume\":\"35 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-10-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The Journal of Undergraduate Research at the University of Illinois at Chicago\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.5210/JUR.V2I1.7465\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Journal of Undergraduate Research at the University of Illinois at Chicago","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.5210/JUR.V2I1.7465","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
II型砷化铟/锑化镓(InAs-GaSb)应变层超晶格(SLS)半导体是红外成像应用中检测长波红外(LWIR)信号的最佳材料。然而,与所有的晶体结构一样,在半导体表面的悬垂键必须用钝化剂来安抚,以保持半导体的完整性。我们通过检查由二氧化硅(sio2)、氮化硅(Si x N y)和硫化锌(ZnS)平静的器件的材料和器件特性,报告了这种III-V半导体最有效的钝化层。我们的最终报告表明,预钝化硫化铵((nh4) 2s)的ZnS是最有效的钝化剂。
Optimization of Surface Passivation for InAs-GaSb Infrared Photodetector
A type II indium arsenide / gallium antimonide (InAs-GaSb) strained layer superlattice (SLS) semiconductor is optimal for detecting long wavelength infrared (LWIR) signals for infrared imaging applications. However, as with all crystal structures dangling bonds at the surface of the semiconductor must be pacified with a passivant to maintain the integrity of the semiconductor. We report the most effective passivation layer for this III-V semiconductor by examining both the material and device characteristics of the devices pacified by silicon dioxide (SiO 2 ), silicon nitride (Si x N y ), and zinc sulfide (ZnS). Our final reporting shows ZnS with a pre-passivation of ammonium sulfide ((NH 4 ) 2 S) as being the most effective passivant.