红外探测用超掺硅薄膜

J. Mathews
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引用次数: 0

摘要

超掺硅材料通过在硅带隙中形成中间带,将硅的响应范围扩展到近红外。Ti超掺Si (Si:Ti)具有亚带隙光响应。在这项工作中,我们制作和表征了Si:Ti光电二极管,并优化了结构。在室温下,在电信波长1550nm处获得了3.5×10-3 EQE。可探测的响应延伸至2250nm。结果表明,Si:Ti材料既具有Si:Ti光伏电池的潜力,又具有商业化红外探测的潜力。为了提高Si:Ti光电探测器的效率,讨论了吸收速率、器件结构和Si:Ti晶体质量对光电探测器效率的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hyperdoped Si thin films for infrared detection
Hyperdoped Si materials extend Si response range into near infrared by forming intermediate band in Si band gap. Ti hyperdoped Si (Si:Ti) has been demonstrated to have subbandgap photo response. In this work, we fabricated and characterized Si:Ti photodiodes and optimized the structure. At room temperature, the 3.5×10-3 EQE has been obtained at telecommunication wavelength 1550nm. And the detectable response extends until 2250nm. The results show the potential of Si:Ti materials being both Si:Ti photovoltaics and commercialized IR detection. To improve the efficiency of Si:Ti photodetectors, the affection of absorption rate, devices structure and the Si:Ti crystal quality is discussed.
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