90nm CMOS超低功耗容错SRAM设计

Kuande Wang, Li Chen, Jinsheng Yang
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引用次数: 10

摘要

为了减轻单事件效应,提高亚阈值SRAM的稳定性,并保持其低功耗特性,提出了一种基于90nm CMOS技术的双联锁存储单元(DICE)的SRAM单元,以消除传统DICE单元在读取操作中的缺点。为了使所提出的SRAM单元在0.3V ~ 0.6V的不同电源电压下工作,采用改进的复制感知方案产生参考控制信号,从而获得最佳的读取时间。本文对256 × 8bytes SRAM内核进行了仿真,在VDD = 0.3V时工作频率高达4.7MHz,功耗为6.0µW,而在VDD = 0.6V时工作频率为45.5MHz,功耗为140µW。采用90nm CMOS技术完成了SRAM核心的布局。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
AN ultra low power fault tolerant SRAM design in 90nm CMOS
To mitigate the single-event effect, improve the stability and also maintain the low power characteristic of sub-threshold SRAM, a Dual Interlocked Storage Cell (DICE) based SRAM cell in 90nm CMOS technology was proposed to eliminate the drawback of conventional DICE cell during read operation. In order to make the proposed SRAM cell work under different power supply voltages from 0.3V to 0.6V, an improved replica sense scheme is applied to produce a reference control signal, with which the optimal read time could be achieved. In this paper, a 256 × 8bytes SRAM core was simulated and the operating frequency at VDD = 0.3V is up to 4.7MHz with power dissipation 6.0µW, while it is 45.5MHz at VDD = 0.6V dissipating 140µW. The layout of SRAM core was also done in 90nm CMOS technology.
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