基于先进MOL技术的3nm GAA制程标准电池设计优化

Giyoung Yang, Hakchul Jung, J. Lim, Jaewoo Seo, Ingyum Kim, Jisun Yu, H. You, Jeongsoon Kong, Garoom Kim, Minjae Jeong, Chanhee Park, Sera An, W. Rim, Hayoung Kim, Dalhee Lee, S. Baek, Jonghoon Jung, T. Song, J. Kye
{"title":"基于先进MOL技术的3nm GAA制程标准电池设计优化","authors":"Giyoung Yang, Hakchul Jung, J. Lim, Jaewoo Seo, Ingyum Kim, Jisun Yu, H. You, Jeongsoon Kong, Garoom Kim, Minjae Jeong, Chanhee Park, Sera An, W. Rim, Hayoung Kim, Dalhee Lee, S. Baek, Jonghoon Jung, T. Song, J. Kye","doi":"10.1109/vlsitechnologyandcir46769.2022.9830450","DOIUrl":null,"url":null,"abstract":"In this paper, standard cell design challenges for the 3nm process are introduced, solved, and optimized using the advanced MOL technology, AC P–N connection. In this methodology, each drain nodes of P and NMOS are connected using a single MOL layer (AC). Utilizing the AC P–N connection, standard cell library can be improved in three different ways. First, reduce the parasitic wire resistance by more than 20% and improve circuit reliability by alleviating a high current density. Second, Ceff improvement by composing only the MOL layer (AC) for the output node of the cell improves the standard cell speed up to 9.6%. Third, we propose a novel Flip-Flop (FF) structure optimized for AC P–N connection, thus improving the speed of the FF (1/TD2Q) by 9.1%.","PeriodicalId":332454,"journal":{"name":"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2022-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Standard Cell Design Optimization with Advanced MOL Technology in 3nm GAA Process\",\"authors\":\"Giyoung Yang, Hakchul Jung, J. Lim, Jaewoo Seo, Ingyum Kim, Jisun Yu, H. You, Jeongsoon Kong, Garoom Kim, Minjae Jeong, Chanhee Park, Sera An, W. Rim, Hayoung Kim, Dalhee Lee, S. Baek, Jonghoon Jung, T. Song, J. Kye\",\"doi\":\"10.1109/vlsitechnologyandcir46769.2022.9830450\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, standard cell design challenges for the 3nm process are introduced, solved, and optimized using the advanced MOL technology, AC P–N connection. In this methodology, each drain nodes of P and NMOS are connected using a single MOL layer (AC). Utilizing the AC P–N connection, standard cell library can be improved in three different ways. First, reduce the parasitic wire resistance by more than 20% and improve circuit reliability by alleviating a high current density. Second, Ceff improvement by composing only the MOL layer (AC) for the output node of the cell improves the standard cell speed up to 9.6%. Third, we propose a novel Flip-Flop (FF) structure optimized for AC P–N connection, thus improving the speed of the FF (1/TD2Q) by 9.1%.\",\"PeriodicalId\":332454,\"journal\":{\"name\":\"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-06-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830450\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830450","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文介绍了3nm工艺的标准电池设计挑战,并利用先进的MOL技术,AC P-N连接进行了解决和优化。在这种方法中,P和NMOS的每个漏极节点使用单个MOL层(AC)连接。利用交流P-N连接,标准单元库可以通过三种不同的方式进行改进。首先,将寄生线电阻降低20%以上,并通过减轻高电流密度来提高电路可靠性。其次,通过仅组成电池输出节点的MOL层(AC)来改进Ceff,将标准电池速度提高到9.6%。第三,我们提出了一种针对交流P-N连接优化的新颖触发器(FF)结构,从而将FF (1/TD2Q)的速度提高了9.1%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Standard Cell Design Optimization with Advanced MOL Technology in 3nm GAA Process
In this paper, standard cell design challenges for the 3nm process are introduced, solved, and optimized using the advanced MOL technology, AC P–N connection. In this methodology, each drain nodes of P and NMOS are connected using a single MOL layer (AC). Utilizing the AC P–N connection, standard cell library can be improved in three different ways. First, reduce the parasitic wire resistance by more than 20% and improve circuit reliability by alleviating a high current density. Second, Ceff improvement by composing only the MOL layer (AC) for the output node of the cell improves the standard cell speed up to 9.6%. Third, we propose a novel Flip-Flop (FF) structure optimized for AC P–N connection, thus improving the speed of the FF (1/TD2Q) by 9.1%.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信