离子束计算的基础和实际光学处理的挑战

D. Schaefer
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引用次数: 7

摘要

离子束加工(IBF)是目前生产超精密光学表面的一种著名的精加工技术。光学元件的直径可以在5毫米到2000毫米的范围内。最新的内部开发将范围扩展到1毫米,这紧跟即将到来的微光学系统市场。除了IBF,离子束刻蚀技术(IBE)可以通过不同的方法改善粗糙度。可以平滑从< 100 nm到> 10 μm的特征尺寸。然而,IBF或IBE技术的操作参数需要与光学元件相适应。除了正确选择离子束尺寸(工具尺寸)以消除光学元件的等效特征尺寸外,形状(凹/凸)也很重要,要考虑副作用,如重新溅射或源自离子束源的污染。本文将列出用于超精密光学制造的离子束技术的现状,考虑到高效光学精加工的所有参数和副作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Basics of ion beam figuring and challenges for real optics treatment
Nowadays Ion Beam Figuring (IBF) is a well-known finishing technique for the production of ultra-precise optical surfaces. The diameter of optics can be in the range of 5 mm up to 2000 mm. Newest in-house developments extend the range down to 1 mm, which follows the upcoming market for micro optical systems. Besides IBF, ion beam etching technology (IBE) enables roughness improvement by different methods. Feature sizes from < 100 nm up to > 10 μm can be smoothed. However, operational parameters of IBF or IBE technology need to be adapted to the optical element. Beside the right choice of ion beam sizes (tool size) to remove equivalent feature sizes of the optics, also the shape (concave/convex) is of importance to consider side effects like re-sputtering or contamination originating from the ion beam source. This article will tabulate the state of the art of ion beam technology for ultra-precise optics manufacturing considering all parameters and side effects for efficient optics finishing.
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