{"title":"一种技术独立的MOS倍增发生器","authors":"Kung-chao Chu, Ramautar Sharma","doi":"10.1109/DAC.1984.1585779","DOIUrl":null,"url":null,"abstract":"A layout generator for technology independent implementation of the MOS multiplier is described. The modified Booth's algorithm with a structured floor plan has been used. The layout has been optimized and described as a program in a high level layout language. The fabrication process related information is maintained in a separate technology database that is coupled with the layout program at the time of execution to generate the mask data. The user can choose from a variety of architectures for speed, area, and power trade-off's. The user can also specify geometric and electrical constraints tailored to his system specification.","PeriodicalId":188431,"journal":{"name":"21st Design Automation Conference Proceedings","volume":"46 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1984-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"A Technology Independent MOS Multiplier Generator\",\"authors\":\"Kung-chao Chu, Ramautar Sharma\",\"doi\":\"10.1109/DAC.1984.1585779\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A layout generator for technology independent implementation of the MOS multiplier is described. The modified Booth's algorithm with a structured floor plan has been used. The layout has been optimized and described as a program in a high level layout language. The fabrication process related information is maintained in a separate technology database that is coupled with the layout program at the time of execution to generate the mask data. The user can choose from a variety of architectures for speed, area, and power trade-off's. The user can also specify geometric and electrical constraints tailored to his system specification.\",\"PeriodicalId\":188431,\"journal\":{\"name\":\"21st Design Automation Conference Proceedings\",\"volume\":\"46 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1984-06-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"21st Design Automation Conference Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DAC.1984.1585779\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"21st Design Automation Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DAC.1984.1585779","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A layout generator for technology independent implementation of the MOS multiplier is described. The modified Booth's algorithm with a structured floor plan has been used. The layout has been optimized and described as a program in a high level layout language. The fabrication process related information is maintained in a separate technology database that is coupled with the layout program at the time of execution to generate the mask data. The user can choose from a variety of architectures for speed, area, and power trade-off's. The user can also specify geometric and electrical constraints tailored to his system specification.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
