(非极性)m-Zn(Mg)O光电器件的制备和表面泄漏抑制

B. Hinkov, H. Hoang, D. Ristanić, M. Hugues, J. Chauveau, G. Strasser
{"title":"(非极性)m-Zn(Mg)O光电器件的制备和表面泄漏抑制","authors":"B. Hinkov, H. Hoang, D. Ristanić, M. Hugues, J. Chauveau, G. Strasser","doi":"10.1117/12.2584830","DOIUrl":null,"url":null,"abstract":"Zincoxide is a rather new material system and promising candidate for mid-infrared (mir) and THz optoelectronic devices like quantum cascade lasers (QCLs) and detectors (QCDs) due to its twice as high LO-phonon energy as GaAs. The non-polar m-plane orientation allows designing and realizing such complex devices without internal electrical fields.\nWe present the full fabrication scheme of such QCL/QCD devices including novel optimized etching techniques, surface leakage current suppression by multiple orders of magnitude and low resistance Ohmic contacts (~10^(-5) Ohm x cm^2). Optimized fabrication schemes resulted in fabrication yielding up to more than 80% of operational devices.","PeriodicalId":296935,"journal":{"name":"Oxide-based Materials and Devices XII","volume":"59 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Fabrication and surface-leakage suppression in (non-polar) m-Zn(Mg)O optoelectronic devices\",\"authors\":\"B. Hinkov, H. Hoang, D. Ristanić, M. Hugues, J. Chauveau, G. Strasser\",\"doi\":\"10.1117/12.2584830\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Zincoxide is a rather new material system and promising candidate for mid-infrared (mir) and THz optoelectronic devices like quantum cascade lasers (QCLs) and detectors (QCDs) due to its twice as high LO-phonon energy as GaAs. The non-polar m-plane orientation allows designing and realizing such complex devices without internal electrical fields.\\nWe present the full fabrication scheme of such QCL/QCD devices including novel optimized etching techniques, surface leakage current suppression by multiple orders of magnitude and low resistance Ohmic contacts (~10^(-5) Ohm x cm^2). Optimized fabrication schemes resulted in fabrication yielding up to more than 80% of operational devices.\",\"PeriodicalId\":296935,\"journal\":{\"name\":\"Oxide-based Materials and Devices XII\",\"volume\":\"59 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-03-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Oxide-based Materials and Devices XII\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2584830\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Oxide-based Materials and Devices XII","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2584830","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

氧化锌是一种相当新的材料体系,由于其lo声子能量是GaAs的两倍,因此它是中红外(mir)和太赫兹光电子器件(如量子级联激光器(qcl)和探测器(QCDs)的有希望的候选者。非极性m平面取向允许设计和实现这种没有内部电场的复杂器件。我们提出了这种QCL/QCD器件的完整制造方案,包括新的优化蚀刻技术,表面泄漏电流抑制多个数量级和低电阻欧姆接触(~10^(-5)欧姆x cm^2)。优化的制造方案导致制造产量高达80%以上的操作设备。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication and surface-leakage suppression in (non-polar) m-Zn(Mg)O optoelectronic devices
Zincoxide is a rather new material system and promising candidate for mid-infrared (mir) and THz optoelectronic devices like quantum cascade lasers (QCLs) and detectors (QCDs) due to its twice as high LO-phonon energy as GaAs. The non-polar m-plane orientation allows designing and realizing such complex devices without internal electrical fields. We present the full fabrication scheme of such QCL/QCD devices including novel optimized etching techniques, surface leakage current suppression by multiple orders of magnitude and low resistance Ohmic contacts (~10^(-5) Ohm x cm^2). Optimized fabrication schemes resulted in fabrication yielding up to more than 80% of operational devices.
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