尝试使用动作参数对C电枢进行优化和分析

G. Goyal, J. P. Khatait, S. Mukherjee
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引用次数: 1

摘要

本文介绍了优化c型电枢的尝试,以提高电磁发射器(EML)的性能。引入了一组称为动作参数(AP)的新参数:电枢动作(AA)和动作常数(AC)。有了这些参数,就可以比较不同尺寸、几何形状和特征的电枢。至少在理论上,也可以使用这些参数以迭代的方式实现所需的接触力。研究了一个30毫米宽的电枢,初始长度为60毫米。所考虑的例子中,接触力达到目标的99.86%,速度提高了2.75。总的来说,目前的电枢设计是在机械顺应性和过大接触力损失之间的权衡,需要一种新的电枢设计来提高EML效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Attempts at optimization and analysis of C armatures using action parameters
This article describes attempts at optimizing C-armatures for improved performance in an Electro-Magnetic Launcher (EML). A set of new parameters called Action Parameters (AP) are introduced: Armature Action (AA) and Action Constant (AC). With these parameters, it is possible to compare armatures of varying size, geometry, and features. It is also possible to achieve, at least in theory, the desired contact force in an iterative manner using these parameters. A study is made on a 30 mm width armature with an initial length of 60 mm. The contact force is reached 99.86% of the target and velocity is increased 2.75 in the example considered. Overall, it is concluded that the current armature design is a trade-off between mechanical compliance and losses from excessive contact force, and a new armature design is needed to improve EML efficiency.
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