{"title":"选择晶体管调制单元阵列结构测试EEPROM的可靠性","authors":"F. Pio, E. Gomiero","doi":"10.1109/ICMTS.2000.844434","DOIUrl":null,"url":null,"abstract":"A test structure consisting of a not addressable EEPROM cell array is presented together with the measurement methodology. Accurate information on the threshold voltage distribution of the cells in the array is obtained from the transfer characteristic measured under select transistor clamping bias. We discuss in detail the working principle and the different levels of approximation, presenting several results for early process/design reliability evaluation (bake retention, control gate stress, programming pulse optimisation).","PeriodicalId":447680,"journal":{"name":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","volume":"114 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Select transistor modulated cell array structure test for EEPROM reliability\",\"authors\":\"F. Pio, E. Gomiero\",\"doi\":\"10.1109/ICMTS.2000.844434\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A test structure consisting of a not addressable EEPROM cell array is presented together with the measurement methodology. Accurate information on the threshold voltage distribution of the cells in the array is obtained from the transfer characteristic measured under select transistor clamping bias. We discuss in detail the working principle and the different levels of approximation, presenting several results for early process/design reliability evaluation (bake retention, control gate stress, programming pulse optimisation).\",\"PeriodicalId\":447680,\"journal\":{\"name\":\"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)\",\"volume\":\"114 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-03-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2000.844434\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2000.844434","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Select transistor modulated cell array structure test for EEPROM reliability
A test structure consisting of a not addressable EEPROM cell array is presented together with the measurement methodology. Accurate information on the threshold voltage distribution of the cells in the array is obtained from the transfer characteristic measured under select transistor clamping bias. We discuss in detail the working principle and the different levels of approximation, presenting several results for early process/design reliability evaluation (bake retention, control gate stress, programming pulse optimisation).