不同AlGaAs间隔层厚度的GaAs/AlGaAs调制掺杂结构的太赫兹辐射磁场取向依赖性

E. Estacio, C. Ponseca, A. Quema, G. Diwa, H. Murukami, S. Ono, A. Somintac, Michelle Bailon, A. Salvador, Nobuhiko Sarukura
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引用次数: 0

摘要

研究了不同间隔层厚度的GaAs/AlGaAs调制掺杂结构的太赫兹辐射强度与磁场取向的关系。结果在结电场、载流子迁移率和界面粗糙度的背景下进行了分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Magnetic field orientation dependence of the terahertz radiation from GaAs/AlGaAs modulation-doped structures with varying AlGaAs spacer-layer thickness
The magnetic field orientation dependence of the terahertz radiation intensity from GaAs/AlGaAs modulation-doped structures with varying spacer thickness was investigated. Results are analyzed in the context of junction electric field, carrier mobility, and interface roughness.
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