在ADAPT抛光中出现的进给方向中频误差

S. Killinger, J. Liebl, R. Rascher
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引用次数: 2

摘要

先前的研究表明,利用Satisloh公司的ADAPT工具进行计算机控制抛光(CCP)对光学制造中的形状误差进行校正是有效的。然而,这种方法有在中频误差(MSFE)范围内产生残余误差的风险。为了防止这些误差,研究了进给方向上的剩余量以及在不同参数下的行为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mid-spatial frequency errors in feed direction occurring in ADAPT polishing
Previous work shows the effectiveness of computer controlled polishing (CCP) with the ADAPT tool by Satisloh for correcting form errors in optics manufacturing. This method however has a risk of producing residual errors in the range of mid spatial frequency errors (MSFE). In order to prevent these errors the residual in feed direction is investigated as well as the behavior at different parameters.
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