{"title":"随机退化和分布缺陷浓度的危险功能含义","authors":"J. A. Nachlas, C. Cassady, K.F. Rooney","doi":"10.1109/RAMS.1995.513248","DOIUrl":null,"url":null,"abstract":"Two candidate models of the relationship between the initial defect concentration in a population of integrated circuit (IC) devices and the associated life distribution are presented. One of the models is based specifically upon wafer geometry while the other portrays stochastic deterioration as the the accumulation of degradation reaction product. The two models are subjected to computer simulation in order to determine if either displays behavior that is consistent with empirical experience. Unfortunately, while both models display some reasonable behavior, neither may be said to provide an adequate general description of IC failure dependence upon initial defects.","PeriodicalId":143102,"journal":{"name":"Annual Reliability and Maintainability Symposium 1995 Proceedings","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Hazard-function implications of stochastic-deterioration and distributed-defect concentrations\",\"authors\":\"J. A. Nachlas, C. Cassady, K.F. Rooney\",\"doi\":\"10.1109/RAMS.1995.513248\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Two candidate models of the relationship between the initial defect concentration in a population of integrated circuit (IC) devices and the associated life distribution are presented. One of the models is based specifically upon wafer geometry while the other portrays stochastic deterioration as the the accumulation of degradation reaction product. The two models are subjected to computer simulation in order to determine if either displays behavior that is consistent with empirical experience. Unfortunately, while both models display some reasonable behavior, neither may be said to provide an adequate general description of IC failure dependence upon initial defects.\",\"PeriodicalId\":143102,\"journal\":{\"name\":\"Annual Reliability and Maintainability Symposium 1995 Proceedings\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-01-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Annual Reliability and Maintainability Symposium 1995 Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RAMS.1995.513248\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Annual Reliability and Maintainability Symposium 1995 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RAMS.1995.513248","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Hazard-function implications of stochastic-deterioration and distributed-defect concentrations
Two candidate models of the relationship between the initial defect concentration in a population of integrated circuit (IC) devices and the associated life distribution are presented. One of the models is based specifically upon wafer geometry while the other portrays stochastic deterioration as the the accumulation of degradation reaction product. The two models are subjected to computer simulation in order to determine if either displays behavior that is consistent with empirical experience. Unfortunately, while both models display some reasonable behavior, neither may be said to provide an adequate general description of IC failure dependence upon initial defects.