光学照明下选择性掺杂和微加工硅片的平面波传输响应

International Topical Meeting on Microwave Photonics. MWP'99. Technical Digest (Cat. No.99EX301) Pub Date : 1999-11-17 DOI:10.1109/MWP.1999.819677

D. S. Lockyer, J. Vardaxoglou, M. J. Kearney

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引用次数: 3

摘要

描述了选择性掺杂和微加工硅片传输特性的光学操纵。这是通过光激发硅和诱导伪导电等离子体来实现的。对理论和实验进行了比较，并考虑了等离子体的损耗特性。

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Plane wave transmission response of selectively doped and micromachined silicon wafers under optical illumination

The optical manipulation of the transmission properties of selectively doped and micromachined silicon wafers is described. This is achieved by means of optically exciting the silicon and inducing pseudo-conducting plasma. Comparisons between theory and experiment are made and consideration is made of the lossy nature of the plasma.

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International Topical Meeting on Microwave Photonics. MWP'99. Technical Digest (Cat. No.99EX301)

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