缓冲成分对高压AlGaN/GaN hfet动态导通电阻的影响

O. Hilt, Eldad Bahat Treidel, E. Cho, S. Singwald, J. Wurfl
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引用次数: 45

摘要

在正常关断的GaN- hfet中,使用掺杂碳的GaN缓冲器或AlGaN缓冲器进行的开关实验显示,动态导通电阻的增加幅度非常不同。分析了动态导通电阻在缓冲器组成变化中的作用,并将其与缓冲器的阻压强度联系起来。此外,还研究了p-GaN栅极正关和肖特基栅极正关器件技术对色散的影响。结果表明,具有较少陷阱位点和较低击穿强度的缓冲器比含有受体的缓冲器更有利于高压开关,以提高缓冲器的击穿强度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of buffer composition on the dynamic on-state resistance of high-voltage AlGaN/GaN HFETs
Switching experiments with normally-off GaN-HFETs using a carbon-doped GaN buffer or an AlGaN buffer showed very different magnitudes of increased dynamic on-state resistance. The dynamic on-state resistance is analyzed for variations in buffer composition and set into relation to the buffer voltage-blocking strength. Also, the impact of p-GaN gate normally-off and Schottky-gate normally-on device technologies on the dispersion is studied. It is concluded that a buffer with less trap sites and lower breakdown strength is more favorable for high-voltage switching than a buffer with incorporated acceptors to increase the buffer breakdown strength.
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