ZnO-GO复合薄膜的光催化活性和稳定性

2021 International Semiconductor Conference (CAS) Pub Date : 2021-10-06 DOI:10.1109/CAS52836.2021.9604130

C. Bogatu, S. Gheorghita, D. Perniu, C. Obreja, O. Buiu, A. Duţă

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引用次数: 0

摘要

本研究考察了两层可见光活性复合薄膜ZnO/ZnO- go的光催化活性和长期稳定性:(a)在UV+VIS (55W/m2)和(b)在100% UV (3W/ m2)下，以亚甲基蓝(c = 10 ppm)为标准污染物，长达48小时。考虑光催化前后透光率和粗糙度(RMS)的变化与影响光催化剂表面的过程相关，讨论了光催化剂的稳定性。在UV+VIS照射48h后，ZnO薄膜的光降解效率达到98%;这也是最稳定的膜，在UV+VIS照射48 h前后透光率低(< 10%)，RMS (<10 nm)变化。

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Photocatalytic activity and stability of the ZnO-GO composite thin films

This study investigates the photocatalytic activity and long-term stability of a two layered Vis-active composite thin films ZnO/ZnO-GO: (a) under UV+VIS irradiation (55W/m2) and (b) under 100% UV (3W/ m2), for up to 48 h, using methylene blue (c = 10 ppm) as standard pollutant. The photocatalysts stability is discussed considering the variation in transmittance and roughness (RMS) before/after photocatalysis correlated with the processes affecting the photocatalyst surfaces. The photo-degradation efficiencies reach 98% after 48h under UV+VIS irradiation for the thin film sprayed on a thinner ZnO layer; that was also the mostly stable film, with low transmittance (<10 %) and RMS (<10 nm) variations before/after 48 h of UV+VIS irradiation.

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2021 International Semiconductor Conference (CAS)

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