脉冲激光退火对ZnS/ZnSe异质结构光学和结构性能的影响

H. Howari
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引用次数: 1

摘要

对半导体薄膜进行了脉冲激光退火(PLA),研究了激光热对薄膜光学和结构参数的影响。利用PVD技术在8.2*10-6 mbar的压力下,在石英衬底上沉积了ZnS/ZnSe薄膜。利用CO2脉冲激光在不同激光功率下对这些薄膜进行退火。记录了退火前后的透射和反射光谱。观察到退火后透射和反射光谱的减小。计算了退火前后的吸收系数、折射率、阻尼系数和介电常数。在退火过程中发现了光学参数的变化。测定了ZnS和ZnSe的能带隙。退火后,由于ZnS/ZnSe薄膜颗粒状纳米结构的改善,吸收系数增加。制备的样品在退火前后的XRD谱图显示,退火后的晶体结构有所增强。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pulsed Laser Annealing Effect on Optical and Structural Properties of ZnS/ZnSe Heterostructures
Studies of pulsed laser annealing (PLA) on semiconductor thin films were performed to examine changes of the optical and structural parameters due to the laser heat. Thin films of ZnS/ZnSe were deposited on quartz substrates at a pressure of 8.2*10-6 mbar using PVD technique. These thin films were annealed at different laser powers using CO2 pulsed laser. Transmission and reflection spectra were recorded before and after the annealing process. A decrease in the transmission and reflection spectra after annealing is observed. The absorption coefficient, refractive index, damping coefficient and dielectric constant were calculated before and after the annealing process. Changes in the optical parameters are found after the annealing process. The energy band gaps of ZnS and ZnSe have been determined. Upon annealing, an increase in the absorption coefficient is observed which is due to an improvement in the granular nanostructure of the ZnS/ZnSe thin films. XRD patterns of the prepared samples were obtained before and after the annealing procedure and revealed an enhancement in the crystallite structure upon annealing.
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