Alvaro Aguirre Fontenla, I. Hegeman, W. Hendriks, M. Dijkstra, S. G. Blanco
{"title":"低损耗反应溅射沉积氧化钛波导","authors":"Alvaro Aguirre Fontenla, I. Hegeman, W. Hendriks, M. Dijkstra, S. G. Blanco","doi":"10.1109/GFP51802.2021.9673908","DOIUrl":null,"url":null,"abstract":"In this work, the fabrication process of optical channel waveguides in titanium dioxide is optimized, including the sputter deposition of titanium dioxide, the reflow of the electron-beam resist and annealing of the etched waveguides. The propagation losses of the films and fully etched strip waveguides had values below 1 dB/cm at wavelengths above 633 nm with propagation losses as low as 0.5 dB/cm at 1550 nm.","PeriodicalId":158770,"journal":{"name":"2021 IEEE 17th International Conference on Group IV Photonics (GFP)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Low-loss reactive sputter deposited titanium oxide waveguides\",\"authors\":\"Alvaro Aguirre Fontenla, I. Hegeman, W. Hendriks, M. Dijkstra, S. G. Blanco\",\"doi\":\"10.1109/GFP51802.2021.9673908\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, the fabrication process of optical channel waveguides in titanium dioxide is optimized, including the sputter deposition of titanium dioxide, the reflow of the electron-beam resist and annealing of the etched waveguides. The propagation losses of the films and fully etched strip waveguides had values below 1 dB/cm at wavelengths above 633 nm with propagation losses as low as 0.5 dB/cm at 1550 nm.\",\"PeriodicalId\":158770,\"journal\":{\"name\":\"2021 IEEE 17th International Conference on Group IV Photonics (GFP)\",\"volume\":\"29 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 IEEE 17th International Conference on Group IV Photonics (GFP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GFP51802.2021.9673908\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE 17th International Conference on Group IV Photonics (GFP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GFP51802.2021.9673908","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
In this work, the fabrication process of optical channel waveguides in titanium dioxide is optimized, including the sputter deposition of titanium dioxide, the reflow of the electron-beam resist and annealing of the etched waveguides. The propagation losses of the films and fully etched strip waveguides had values below 1 dB/cm at wavelengths above 633 nm with propagation losses as low as 0.5 dB/cm at 1550 nm.
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