最小植入物区域感知栅极尺寸和位置

A. Kahng, Hyein Lee
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引用次数: 18

摘要

随着最小特征尺寸的减小,最小植入面积(MinIA)限制成为亚22nm技术物理实现流程的新挑战。特别是,MinIA约束引发了一个新的问题公式,其中栅极尺寸和v_t交换现在必须与详细的放置变化密切相关。为了解决这个新问题,我们提出了启发式方法来修复MinIA违规并通过栅极尺寸降低功率,同时最小化放置扰动以避免产生额外的定时违规。与最新版本的商业P&R工具相比,我们的方法在时间/功率限制下显著减少了MinIA违规次数(高达100%)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Minimum implant area-aware gate sizing and placement
With reduction of minimum feature size, the minimum implant area (MinIA) constraint is emerging as a new challenge for the physical implementation flow in sub-22nm technology. In particular, the MinIA constraint induces a new problem formulation wherein gate sizing and V_t-swapping must now be linked closely with detailed placement changes. To solve this new problem, we propose heuristic methods that fix MinIA violations and reduce power with gate sizing while minimizing placement perturbation to avoid creating extra timing violations. Compared to recent versions of commercial P&R tools, our methodologies achieve significant reductions (up to 100%) in the number of MinIA violations under timing/power constraints.
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