包含量子力学效应的纳米四栅极MOSFET分析建模

N. Balamurugan, M. Abirami, B. Buvaneswari, K. Sowmya
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引用次数: 0

摘要

考虑量子力学效应对mosfet性能的影响,提出了四栅极mosfet的解析模型。一种用于求解泊松和薛定谔方程的变量可分离方法,从而揭示量子力学效应。导出了器件运行各区域反转空间电荷密度函数的解析表达式。利用该表达式,可以计算漏极电流、下子带能量、反转电荷片密度、栅极电压等参数。考虑量子力学效应(QME)。这种解析解对各种栅极偏置的量化给出了简单而准确的见解。该分析结果与现有的多栅极MOSFET进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytical modeling of nanoscale Quad Gate MOSFET including quantum mechanical effects
An analytical model for Quad gate MOSFETs considering the quantum mechanical effects that influences the performance of MOSFETs is proposed. A variable separable method used to solve the Poisson and Schrodinger equation which thereby reveals the quantum mechanical effects. An analytical expression of the inversion space charge density function for all region of the devices operation is developed. Using this expression, other parameters like Drain current, Lower sub band energy, Inversion charge sheet density, gate voltage are calculated. By considering Quantum Mechanical Effect (QME). This analytical solution gives simple and accurate insight into the quantization for various gate biases. This analytical result is compared with other existing multi gate MOSFET.
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