深度度量学习中具有正负对距离的评价指标分析

Hajime Oi, Rei Kawakami, T. Naemura
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引用次数: 1

摘要

深度度量学习(Deep metric learning, DML)通过深度学习获得嵌入,其中同一类样本之间的距离比不同类样本之间的距离短。以前的DML研究提出了新的指标来克服一般指标的问题,但它们存在以下两个问题;一是他们只考虑了整个数据分布的一小部分,二是当类别数量不同时,他们的分数不能在方法之间直接比较。为了分析这些问题,我们考虑任意正对和负对内积的直方图。我们可以通过测量两个直方图之间的距离来评估整个分布。通过对直方图的面积进行归一化,我们还可以消除类别数量的影响。在实验中,直方图的可视化显示现有DML方法的嵌入不能很好地泛化到验证集。我们还证实,与Recall@1和MAP@R相比,正负直方图之间距离的评估受类别数量变化的影响较小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of Evaluation Metrics with the Distance between Positive Pairs and Negative Pairs in Deep Metric Learning
Deep metric learning (DML) acquires embeddings via deep learning, where distances among samples of the same class are shorter than those of different classes. The previous DML studies proposed new metrics to overcome the issues of general metrics, but they have the following two problems; one is that they consider only a small portion of the whole distribution of the data, and the other is that their scores cannot be directly compared among methods when the number of classes is different. To analyze these issues, we consider the histograms of the inner products between arbitrary positive pairs and those of negative pairs. We can evaluate the entire distribution by measuring the distance between the two histograms. By normalizing the histograms by their areas, we can also cancel the effect of the number of classes. In experiments, visualizations of the histograms revealed that the embeddings of the existing DML methods do not generalize well to the validation set. We also confirmed that the evaluation of the distance between the positive and negative histograms is less affected by the variation in the number of classes compared with Recall@1 and MAP@R.
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