{"title":"磁控溅射中等离子体源改善薄膜应力和表面粗糙度","authors":"S. S. Thöny, S. Gees, E. Schüngel","doi":"10.1364/OIC.2019.WC.4","DOIUrl":null,"url":null,"abstract":"Equipping a magnetron sputter deposition system with an additional plasma source allows to improve surface roughness and film stress independent of the sputter parameters. This will be shown at the example of a HfO2/SiO2 UV mirror and of hydrogenated amorphous silicon.","PeriodicalId":119323,"journal":{"name":"Optical Interference Coatings Conference (OIC) 2019","volume":"215 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Improving film stress and surface roughness by using a plasma source in magnetron sputtering\",\"authors\":\"S. S. Thöny, S. Gees, E. Schüngel\",\"doi\":\"10.1364/OIC.2019.WC.4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Equipping a magnetron sputter deposition system with an additional plasma source allows to improve surface roughness and film stress independent of the sputter parameters. This will be shown at the example of a HfO2/SiO2 UV mirror and of hydrogenated amorphous silicon.\",\"PeriodicalId\":119323,\"journal\":{\"name\":\"Optical Interference Coatings Conference (OIC) 2019\",\"volume\":\"215 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-06-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Interference Coatings Conference (OIC) 2019\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/OIC.2019.WC.4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Interference Coatings Conference (OIC) 2019","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/OIC.2019.WC.4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Improving film stress and surface roughness by using a plasma source in magnetron sputtering
Equipping a magnetron sputter deposition system with an additional plasma source allows to improve surface roughness and film stress independent of the sputter parameters. This will be shown at the example of a HfO2/SiO2 UV mirror and of hydrogenated amorphous silicon.
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