Scanning electron beam induced deposition for conductive tip modification

In this study, we have developed conductive tips with high aspect ratio and good sharpness by scanning electron beam induced deposition (SEBID) method. The structure and morphology of modified conductive tips were performed by analytical transmission electron microscopy (TEM) methods. Atomic force microscope (AFM), scanning Kelvin probe microscopy (SKPM) and electrostatic force microscopy (EFM) analysis were done by using these modified tips and compared to standard commercially scanning probe microscopy (SPM) probes. The SEBID modified tips demonstrate signals with smaller full-width at half-maximum (FWHM) value in EFM measurements. The prepared tips could provide high spatial resolution and high stability to avoid a perturbation of the sensor characterization due to the sample's stray field.