利用多参数表面等离子体共振优化薄膜沉积:一种测定薄层和厚层厚度和折射率的新技术

2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) Pub Date : 2012-08-01 DOI:10.1109/3M-NANO.2012.6472952

J. Kuncova-Kallio, Jussipekka Tuppurainen, Janusz W. Sadowski, Niko Granqvist

{"title":"利用多参数表面等离子体共振优化薄膜沉积:一种测定薄层和厚层厚度和折射率的新技术","authors":"J. Kuncova-Kallio, Jussipekka Tuppurainen, Janusz W. Sadowski, Niko Granqvist","doi":"10.1109/3M-NANO.2012.6472952","DOIUrl":null,"url":null,"abstract":"We present a new method for measuring thicknesses and refractive indices of ultrathin, thin and relatively thick films by using multi-parametric surface plasmon resonance (MP-SPR). The layers measured can be multiple layers of organic, inorganic, metallic, and it is also possible to follow interaction kinetics of interaction components with all these materials. In this paper, MP-SPR is applied as a method for optimization of thin film deposition, here vacuum evaporation.","PeriodicalId":134364,"journal":{"name":"2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimization of thin film deposition using multi-parametric surface plasmon resonance: A new technique to determine thickness and refractive index of thin and thick layers\",\"authors\":\"J. Kuncova-Kallio, Jussipekka Tuppurainen, Janusz W. Sadowski, Niko Granqvist\",\"doi\":\"10.1109/3M-NANO.2012.6472952\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present a new method for measuring thicknesses and refractive indices of ultrathin, thin and relatively thick films by using multi-parametric surface plasmon resonance (MP-SPR). The layers measured can be multiple layers of organic, inorganic, metallic, and it is also possible to follow interaction kinetics of interaction components with all these materials. In this paper, MP-SPR is applied as a method for optimization of thin film deposition, here vacuum evaporation.\",\"PeriodicalId\":134364,\"journal\":{\"name\":\"2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)\",\"volume\":\"40 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/3M-NANO.2012.6472952\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/3M-NANO.2012.6472952","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

提出了一种利用多参数表面等离子体共振(MP-SPR)测量超薄、薄和相对厚薄膜厚度和折射率的新方法。测量的层可以是有机、无机、金属的多层，也可以遵循相互作用组分与所有这些材料的相互作用动力学。本文将MP-SPR作为薄膜沉积的优化方法，这里是真空蒸发。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Optimization of thin film deposition using multi-parametric surface plasmon resonance: A new technique to determine thickness and refractive index of thin and thick layers

We present a new method for measuring thicknesses and refractive indices of ultrathin, thin and relatively thick films by using multi-parametric surface plasmon resonance (MP-SPR). The layers measured can be multiple layers of organic, inorganic, metallic, and it is also possible to follow interaction kinetics of interaction components with all these materials. In this paper, MP-SPR is applied as a method for optimization of thin film deposition, here vacuum evaporation.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

自引率

0.00%

发文量