在SOI平台上首次将InGaAs/InAlAs单光子雪崩二极管(spad)与Si光子学异质集成,用于1550 nm检测

Jishen Zhang, Haiwen Xu, Gong Zhang, Yue Chen, Haibo Wang, K. Tan, S. Wicaksono, Chao Wang, Chen Sun, Qiwen Kong, C. Lim, S. Yoon, Xiao Gong
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引用次数: 1

摘要

首次实现了InGaAs/InAlAs单光子雪崩二极管(spad)与Si光子学的异质集成,并通过低温模对模键合技术进行了演示。采用三平台结构的spad不仅避免了表面暴露在强电场下,而且还减轻了平台边缘的电场密集,我们的集成spad具有高达22%的单光子探测效率(SPDE)和8.6 ×105 Hz的低暗计数率(DCR),这是目前报道的InGaAs/InAlAs spad的最佳性能之一,接近InGaAs/InP spad的性能。器件良率高,性能均匀。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
First InGaAs/InAlAs Single-Photon Avalanche Diodes (SPADs) Heterogeneously Integrated with Si Photonics on SOI Platform for 1550 nm Detection
For the first time, heterogeneous integration of InGaAs/InAlAs single-photon avalanche diodes (SPADs) with Si photonics was realized and demonstrated through a low temperature die-to-die bonding technique. Together with the adoption of a triple-mesa structure in SPADs which not only avoids the surface exposure to the high electric field but also alleviate the electric field crowding at mesa edges, our integrated SPADs exhibit high single-photon detection efficiency (SPDE) of ~22% and low dark count rate (DCR) of 8.6 ×105 Hz, which are among the best performance reported for InGaAs/InAlAs SPADs, and are approaching that of InGaAs/InP SPADs. High device yield and performance uniformity were also achieved.
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