提出了一种利用s参数提取MOSFET有效通道长度的新方法

Seonghearn Lee
{"title":"提出了一种利用s参数提取MOSFET有效通道长度的新方法","authors":"Seonghearn Lee","doi":"10.1109/HKEDM.2000.904215","DOIUrl":null,"url":null,"abstract":"A simple and accurate extraction of the effective channel length is carried out by utilizing the slope information of the the intrinsic gate-to-channel capacitance versus the mask gate length of ultra short-channel devices. The measurement setup where the gate is connected to a RF signal is used to remove the discrepancy problem between conventional I-V and C-V methods. In order to increase the measurement accuracy, the intrinsic gate-to-channel capacitance data are determined by calibrating S-parameter sets measured at GHz using zero-bias data, instead of low-frequency C-V measurements. Contrary to the conventional C-V method, this new RF C-V method results in much smaller deviation from the I-V method.","PeriodicalId":178667,"journal":{"name":"Proceedings 2000 IEEE Hong Kong Electron Devices Meeting (Cat. No.00TH8503)","volume":"218 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"A new RF capacitance method to extract the effective channel length of MOSFET's using S-parameters\",\"authors\":\"Seonghearn Lee\",\"doi\":\"10.1109/HKEDM.2000.904215\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A simple and accurate extraction of the effective channel length is carried out by utilizing the slope information of the the intrinsic gate-to-channel capacitance versus the mask gate length of ultra short-channel devices. The measurement setup where the gate is connected to a RF signal is used to remove the discrepancy problem between conventional I-V and C-V methods. In order to increase the measurement accuracy, the intrinsic gate-to-channel capacitance data are determined by calibrating S-parameter sets measured at GHz using zero-bias data, instead of low-frequency C-V measurements. Contrary to the conventional C-V method, this new RF C-V method results in much smaller deviation from the I-V method.\",\"PeriodicalId\":178667,\"journal\":{\"name\":\"Proceedings 2000 IEEE Hong Kong Electron Devices Meeting (Cat. No.00TH8503)\",\"volume\":\"218 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings 2000 IEEE Hong Kong Electron Devices Meeting (Cat. No.00TH8503)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/HKEDM.2000.904215\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings 2000 IEEE Hong Kong Electron Devices Meeting (Cat. No.00TH8503)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HKEDM.2000.904215","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

利用超短通道器件的本征门-通道电容与掩模门长度的斜率信息,实现了有效通道长度的简单准确提取。门连接到射频信号的测量设置用于消除传统I-V和C-V方法之间的差异问题。为了提高测量精度,本征门到通道电容数据是通过使用零偏置数据校准在GHz下测量的s参数集来确定的,而不是使用低频C-V测量。与传统的C-V方法相反,这种新的RF C-V方法与I-V方法的偏差要小得多。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A new RF capacitance method to extract the effective channel length of MOSFET's using S-parameters
A simple and accurate extraction of the effective channel length is carried out by utilizing the slope information of the the intrinsic gate-to-channel capacitance versus the mask gate length of ultra short-channel devices. The measurement setup where the gate is connected to a RF signal is used to remove the discrepancy problem between conventional I-V and C-V methods. In order to increase the measurement accuracy, the intrinsic gate-to-channel capacitance data are determined by calibrating S-parameter sets measured at GHz using zero-bias data, instead of low-frequency C-V measurements. Contrary to the conventional C-V method, this new RF C-V method results in much smaller deviation from the I-V method.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信