600V常关p栅GaN HEMT短路性能的实验研究

T. Oeder, A. Castellazzi, M. Pfost
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引用次数: 13

摘要

本文研究了正常关断GaN HEMT的短路鲁棒性与施加偏置条件和脉冲持续时间的关系。该结果与先前对正常启动设备的研究一致,突出了电气类型的故障。然而,在这里,具体的栅极驱动电路设计和相应的器件工作条件的相关性被证明。失效的栅极偏置依赖性(GBD)与所施加的漏源电压相关,作为p栅极型器件的一个新的特定特征被引入。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Experimental study of the short-circuit performance for a 600V normally-off p-gate GaN HEMT
In this paper, the short-circuit robustness of a normally-off GaN HEMT is investigated in relation to applied bias conditions and pulse duration. The results align with previous studies on normally-on devices in highlighting an electrical type of failure. Here, however, the relevance of the specific gate-drive circuit design and corresponding device operational conditions is demonstrated. A gate-bias dependence (GBD) of the failure, correlated to the applied drain-source voltage, is introduced as a novel specific feature for the p-Gate type device.
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