集成膜片箝位放大器的电噪声分析

P. Weerakoon, K. Klemic, F. Sigworth, E. Culurciello
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引用次数: 2

摘要

本文介绍了一种制造集成膜片钳放大器的电噪声源和信噪限制的评估。本文还对膜片钳系统的理论噪声进行了数值计算。我们制造的器件在10khz带宽下的rms噪声小于4pA,性能与商用台式系统相似。集成膜片钳可以精确测量纳米安培电流,用于高通量系统,可以并行筛选大量细胞。该器件的硅面积为1480 × 1300 μ m,功率为3.3 V,功率为3.2 mW。该器件采用AMI 0.5 mA微米工艺制备。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrical Noise Analysis of an Integrated Patch-Clamp Amplifier
This paper presents an evaluation of electrical noise sources and signal-to-noise limitations in a fabricated integrated patch-clamp amplifier. We also present numerical calculation of the theoretical noise of the patch-clamp system. Our fabricated device was measured to have less than 4pA of rms noise at 10 kHz bandwidth, similar in performance to commercial bench- top systems. The integrated patch-clamp can accurately measure nano-Amperes of current and is intended for a high-throughput system that can screen a large number of cells in parallel. The fabricated device consumes 1480 by 1300 mum of silicon area and 3.2 mW at 3.3 V of power. The device was fabricated using AMI 0.5 mA Micron technology.
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