光学常数和薄膜厚度的自动评估:应用于薄介电层

E. Pelletier, P. Roche, B. Vidal
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引用次数: 35

摘要

本文简要介绍了一种全自动分光光度计的原理,该分光光度计可测量光谱范围为2 000-7 000 a的光学性质(R, R′,T)。然后用计算机计算法向入射的结果来确定薄膜的光学常数(n, k)和厚度d。对基于连续迭代的计算机程序进行了详细的研究。参数d, n, k必须依次确定。第一次迭代执行计算厚度和平均值n和k在一个大的光谱范围内。复折射率的测定还有待进一步研究,其精度仅受实验误差测量的限制。我们将介绍我们的一些结果。对于某些层,得到的曲线n(λ)显示出特征不连续,可以得出层存在结构缺陷的结论。另一方面,如果蒸发条件相同,则有可能用给定的材料获得几乎完美的层,并且层与层之间的光学常数值相差不大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Automatic evaluation of optical constants and thickness of thin films: application to thin dielectric layers
We briefly describe the principle of a completely automatic spectrophotometer which measures optical properties (R, R', T) in the spectral range 2 000-7 000 A. The results obtained for normal incidence are then used by computer to determine the optical constants (n, k) and thickness d of a thin film. We study in detail the computer program which is based on successive iterations. The parameters d, n, k must be successively determined. First iterations are performed to compute thickness and mean values of n and k over a large spectral range. It remains to determine the complex refractive index, the accuracy being only limited by experimental errors measurements. We present some of our results. For certain layers, the curve n(λ) obtained shows characteristic discontinuities and we conclude that the layer has defects of structure. On the other hand, it is possible to obtain practically perfect layers with given materials and with the values of optical constants differing little from one layer to another if evaporation conditions are identical.
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