金属触点为p型结晶二硒化铜铟

Sunyoung Park, C. Champness, Z. Mi, I. Shih
{"title":"金属触点为p型结晶二硒化铜铟","authors":"Sunyoung Park, C. Champness, Z. Mi, I. Shih","doi":"10.1109/PVSC.2011.6186205","DOIUrl":null,"url":null,"abstract":"To find low resistance metal contacts on p-type crystalline copper indium diselenide (CuInSe2), bilayers of metal contacts were deposited on p-type crystalline CuInSe2. The first metals were Ni, Pt, Se, and Te and the second metals were Au, Ag, Al, and Cu. It was found that the resistance reduced significantly when the surface was etched in a solution containing H2SO4 (1%, w/w) and CrO3 (1%, w/w). It was also confirmed that heat treatment often leads to increase contact resistance. The resistance was measured for over a period of 20 days to estimate the thermal stability of the metal contacts. It was observed that prolonged evacuation time before the metal deposition reduced the resistance.","PeriodicalId":373149,"journal":{"name":"2011 37th IEEE Photovoltaic Specialists Conference","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Metal contacts to p-type crystalline copper indium diselenide\",\"authors\":\"Sunyoung Park, C. Champness, Z. Mi, I. Shih\",\"doi\":\"10.1109/PVSC.2011.6186205\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"To find low resistance metal contacts on p-type crystalline copper indium diselenide (CuInSe2), bilayers of metal contacts were deposited on p-type crystalline CuInSe2. The first metals were Ni, Pt, Se, and Te and the second metals were Au, Ag, Al, and Cu. It was found that the resistance reduced significantly when the surface was etched in a solution containing H2SO4 (1%, w/w) and CrO3 (1%, w/w). It was also confirmed that heat treatment often leads to increase contact resistance. The resistance was measured for over a period of 20 days to estimate the thermal stability of the metal contacts. It was observed that prolonged evacuation time before the metal deposition reduced the resistance.\",\"PeriodicalId\":373149,\"journal\":{\"name\":\"2011 37th IEEE Photovoltaic Specialists Conference\",\"volume\":\"32 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-06-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 37th IEEE Photovoltaic Specialists Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PVSC.2011.6186205\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 37th IEEE Photovoltaic Specialists Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.2011.6186205","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

为了寻找p型铜铟二硒化(CuInSe2)晶体上的低电阻金属触点,在p型铜铟二硒化(CuInSe2)晶体上沉积了双层金属触点。第一种金属是Ni、Pt、Se和Te,第二种金属是Au、Ag、Al和Cu。结果表明,在含有H2SO4 (1%, w/w)和CrO3 (1%, w/w)的溶液中刻蚀,表面电阻显著降低。研究还证实,热处理往往会导致接触电阻增加。测量电阻超过20天,以估计金属触点的热稳定性。观察到,在金属沉积前,较长的放电时间降低了电阻。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Metal contacts to p-type crystalline copper indium diselenide
To find low resistance metal contacts on p-type crystalline copper indium diselenide (CuInSe2), bilayers of metal contacts were deposited on p-type crystalline CuInSe2. The first metals were Ni, Pt, Se, and Te and the second metals were Au, Ag, Al, and Cu. It was found that the resistance reduced significantly when the surface was etched in a solution containing H2SO4 (1%, w/w) and CrO3 (1%, w/w). It was also confirmed that heat treatment often leads to increase contact resistance. The resistance was measured for over a period of 20 days to estimate the thermal stability of the metal contacts. It was observed that prolonged evacuation time before the metal deposition reduced the resistance.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信