A. Boubekeur, J. Patry, G. Saucier, M. Slimane-kadi, J. Trilhe
{"title":"设计晶圆级二维阵列的经验教训","authors":"A. Boubekeur, J. Patry, G. Saucier, M. Slimane-kadi, J. Trilhe","doi":"10.1109/DFTVS.1992.224377","DOIUrl":null,"url":null,"abstract":"Describes how defect tolerance is achieved for a wafer scale architecture that has been implemented on silicon. It gives an overview of a long-term research effort and describes software methods and tools as well as hardware switching devices used to create a defect free 2D array at end of manufacturing. This wafer scale architecture is called ELSA (European Large SIMD Array) and has been studied within an ESPRIT project on wafer scale integration.<<ETX>>","PeriodicalId":319218,"journal":{"name":"Proceedings 1992 IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems","volume":"663 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-11-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Lessons learnt from designing a wafer scale 2D array\",\"authors\":\"A. Boubekeur, J. Patry, G. Saucier, M. Slimane-kadi, J. Trilhe\",\"doi\":\"10.1109/DFTVS.1992.224377\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Describes how defect tolerance is achieved for a wafer scale architecture that has been implemented on silicon. It gives an overview of a long-term research effort and describes software methods and tools as well as hardware switching devices used to create a defect free 2D array at end of manufacturing. This wafer scale architecture is called ELSA (European Large SIMD Array) and has been studied within an ESPRIT project on wafer scale integration.<<ETX>>\",\"PeriodicalId\":319218,\"journal\":{\"name\":\"Proceedings 1992 IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems\",\"volume\":\"663 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1992-11-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings 1992 IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DFTVS.1992.224377\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings 1992 IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DFTVS.1992.224377","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Lessons learnt from designing a wafer scale 2D array
Describes how defect tolerance is achieved for a wafer scale architecture that has been implemented on silicon. It gives an overview of a long-term research effort and describes software methods and tools as well as hardware switching devices used to create a defect free 2D array at end of manufacturing. This wafer scale architecture is called ELSA (European Large SIMD Array) and has been studied within an ESPRIT project on wafer scale integration.<>